Directly UV-photopatternable PLZT thin films prepared with the sol-gel technique

Terho Kololuoma; Jussi Hiltunen; Markus Tuomikoski; Jyrki Lappalainen; Juha T. Rantala

doi:10.1117/12.528803

28 May 2004 Directly UV-photopatternable PLZT thin films prepared with the sol-gel technique

Terho Kololuoma, Jussi Hiltunen, Markus Tuomikoski, Jyrki Lappalainen, Juha T. Rantala

Proceedings Volume 5355, Integrated Optics: Devices, Materials, and Technologies VIII; (2004) https://doi.org/10.1117/12.528803
Event: Integrated Optoelectronic Devices 2004, 2004, San Jose, CA, United States

Abstract

In this study, the sol-gel process to fabricate directly UV-photopatternable lanthanum-doped lead zirconate titanate (PLZT) films was investigated. Photosensitive films were obtained via chemical methacrylic acid modification of metal organic PLZT precursors. Spin-on deposited films were patterned using direct UV-photolithography process. Patterned films were annealed in air, in order to obtain perovskite type crystalline material. AFM and XRD techniques were used for the characterization of the material and fabricated structures. The sol-gel processed PLZT films had good crystallinity, they were crack-free, and had low surface roughness. The films exhibit electro-optic effect being therefore interesting to be used in active integrated optic devices.

Citation Download Citation

Terho Kololuoma, Jussi Hiltunen, Markus Tuomikoski, Jyrki Lappalainen, and Juha T. Rantala "Directly UV-photopatternable PLZT thin films prepared with the sol-gel technique", Proc. SPIE 5355, Integrated Optics: Devices, Materials, and Technologies VIII, (28 May 2004); https://doi.org/10.1117/12.528803

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