6 July 2004 Plasma etching of ZnO: a review
Author Affiliations +
A review of the current literature on plasma etching of ZnO is presented. The etch rates as a function of etch conditions in Cl2-based BCl3-based and CH4-based and related chemistries are reviewed. Resultant surface morphology, anisotropy, surface stoichiometry and band edge photoluminescence results are also discussed.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Karen J. Nordheden, Karen J. Nordheden, "Plasma etching of ZnO: a review", Proc. SPIE 5359, Quantum Sensing and Nanophotonic Devices, (6 July 2004); doi: 10.1117/12.531391; https://doi.org/10.1117/12.531391

Back to Top