Translator Disclaimer
20 June 1985 Contamination Lithography For The Fabrication Of Zone Plate X-Ray Lenses
Author Affiliations +
A VG HB5 STEM has been modified to allow computer controlled contamination writing on thin Carbon substrates. Line widths of 20 nM and height to width aspect ratios of better than 5:1 can be drawn. This writing has been used to fabricate Fresnel zone plates. A patching process is involved with registration to an accuracy of 2.5 nM. Methods and techniques have been developed to compensate for non-linearity of the field scans together with specimen drift. Zone plates of 50 NM diameter and outer zone widths of 40 nM have been con-structed.
© (1985) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
C. J. Buckley, M. T. Browne, and P. Charalambous "Contamination Lithography For The Fabrication Of Zone Plate X-Ray Lenses", Proc. SPIE 0537, Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV, (20 June 1985);

Back to Top