High Brightness Laser/Plasma Source For High Throughput Sub-Micron X-Ray Lithography

A. L. Hoffman; G. F. Albrecht; E. A. Crawford; P. H. Rose

doi:10.1117/12.947502

20 June 1985 High Brightness Laser/Plasma Source For High Throughput Sub-Micron X-Ray Lithography

A. L. Hoffman, G. F. Albrecht, E. A. Crawford, P. H. Rose

Proceedings Volume 0537, Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV; (1985) https://doi.org/10.1117/12.947502
Event: 1985 Microlithography Conferences, 1985, Santa Clara, United States

Abstract

Laser Irradiation of solid targets has been demonstrated to produce an intense source of soft x-rays. Conversion efficiencies of greater than 10 percent of the laser radiation into x-ray emission at energy over 1 keV radiation into 2n ster. have been demonstrated with sub-joule laser pulses. This high conversion efficiency is achieved by using sub-nanosecond pulse lengths, tight focusing, and shaped pulses. A laser capable of producing the requisite high quality laser pulses at 100 Hz repetition rates has been constructed using newly developed slab techniques to maintain good beam quality at high average powers. A windowless target chamber has been designed to mate this source to x-ray stepper/aligners. The present laser permits average x-ray intensities of 2 mW/cm² to be realized at the resist behind typical current BN x-ray masks, with negligible penumbral effects. This is almost an order of magnitude higher than possible with conventional electron beam impact sources. The present source, as well as upgraded laser systems based on this concept, should be a significant factor in the commercialization of production x-ray steppers.

Citation Download Citation

A. L. Hoffman, G. F. Albrecht, E. A. Crawford, and P. H. Rose "High Brightness Laser/Plasma Source For High Throughput Sub-Micron X-Ray Lithography", Proc. SPIE 0537, Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV, (20 June 1985); https://doi.org/10.1117/12.947502

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