20 June 1985 X-Ray Lithography At The Stanford Synchrotron Radiation Laboratory (SSRL)
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Abstract
A dedicated X-ray lithography system has been developed on Beam Line III-4 at the Stanford Synchrotron Radiation Laboratory (SSRL). The research program at SSRL includes studies of the spectral sensitivity of X-ray resists, mask characterization, and the applications of novel X-ray optics. The facilities available for this work and recent results in these areas will be described.
© (1985) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
P. Pianetta, P. Pianetta, R. Redaelli, R. Redaelli, R. Jaeger, R. Jaeger, T. W. Barbee, T. W. Barbee, } "X-Ray Lithography At The Stanford Synchrotron Radiation Laboratory (SSRL)", Proc. SPIE 0537, Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV, (20 June 1985); doi: 10.1117/12.947487; https://doi.org/10.1117/12.947487
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