Paper
20 June 1985 X-Ray Lithography: Can It Be Justified
Alan D. Wilson
Author Affiliations +
Abstract
X-Ray lithography: Can it be justified? This is a question which is being asked in many circles today. The answer is, unfortunately, not black or white nor is it easy to determine. However, there are today more serious players in the x-ray field than there were a few years ago and maybe this is an important indicator. In this paper we will try to establish if x-ray lithography can or can not be soundly justified.
© (1985) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Alan D. Wilson "X-Ray Lithography: Can It Be Justified", Proc. SPIE 0537, Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV, (20 June 1985); https://doi.org/10.1117/12.947489
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Cited by 30 scholarly publications.
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KEYWORDS
Photomasks

Semiconducting wafers

Lithography

X-ray lithography

X-rays

Beam shaping

Electron beam lithography

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