Current status of Nanonex nanoimprint solutions

Hua Tan; Linshu Kong; Mingtao Li; Colby Steere; Larry Koecher

doi:10.1117/12.537241

20 May 2004 Current status of Nanonex nanoimprint solutions

Hua Tan, Linshu Kong, Mingtao Li, Colby Steere, Larry Koecher

Proceedings Volume 5374, Emerging Lithographic Technologies VIII; (2004) https://doi.org/10.1117/12.537241
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

Nanoimprint lithography (NIL) has the advantage of high-throughput, sub-10 nm resolution and low cost [1]. It has been included into 2003 ITRS as the Next Generation Lithography (NGL) for 45 nm node [2]. This paper summarized current status of Nanonex imprint technologies. Nanonex imprint process includes thermal nanoimprint (T-NIL) and photo-curable nanoimprint (P-NIL). Both T-NIL and P-NIL utilized a proprietary air cushion press (ACP), which has the advantage of ultra-uniformity, low lateral stress, less damage to the mold and substrate, and higher alignment accuracy. Nanonex Corporation delivers user-friendly nanoimprint lithography tools and solutions for both experts and non-experts of micro and nanofabrication. Nanoimprint machines, resists, molds and processes have been developed and are available today.

Citation Download Citation

Hua Tan, Linshu Kong, Mingtao Li, Colby Steere, and Larry Koecher "Current status of Nanonex nanoimprint solutions", Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); https://doi.org/10.1117/12.537241

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