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20 May 2004 Development of magnetohydrodynamic computer modeling of gas-discharge EUV sources for microlithography
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Abstract
A magnetohydrodynamic (MHD) model of gas discharges has been developed to accelerate the development of compact, intense sources of EUV radiation for microlithography. The model is an MHD numerical simulation with atomic and radiation physics. The plasma evolution is simulated with the MHRDR (Magneto-Hydro-Radiative-Dynamic-Research) 2D, three-temperature, MHD computer code. The MHD results are postrocessed witha code that caluculated the radiation spectrum from Xe ions, including 13.4-nm EUV output, based on a detailed collisional-radiative atomic kinetics model. A variety of gas discharges relevant to microlithography can be modeled with this new tool.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Bruno S. Bauer, Roberto C. Mancini, Volodymyr Makhin, Ioana Paraschiv, Andrey Esaulov, Radu Presura, Irvin R. Lindemuth, Peter T. Sheehey, and Bryan J. Rice "Development of magnetohydrodynamic computer modeling of gas-discharge EUV sources for microlithography", Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); https://doi.org/10.1117/12.536289
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