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20 May 2004 EUV generation using water droplet target
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Abstract
In this paper, we described a laser plasma source for Extreme Ultraviolet Lithography (EUVL) based on a water droplet target. We successfully generated stable multi-kHz water droplets with several hundred μm diameter using our experimentaql setup. We realized a good synchronization of laser with droplet by employing droplet-probing photo diode (PD) signal to trig YAG laser timely. We got EUV emission with pulse to pulse stability of 3.4% (1σ) from this droplet region without being destroyed due to hot laser plasma formation from the previous droplet.
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Jing Quan Lin, Hidehiko Yashiro, Tatsuya Aota, and Toshihisa Tomie "EUV generation using water droplet target", Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); doi: 10.1117/12.534708; https://doi.org/10.1117/12.534708
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