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20 May 2004 EUV generation using water droplet target
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In this paper, we described a laser plasma source for Extreme Ultraviolet Lithography (EUVL) based on a water droplet target. We successfully generated stable multi-kHz water droplets with several hundred μm diameter using our experimentaql setup. We realized a good synchronization of laser with droplet by employing droplet-probing photo diode (PD) signal to trig YAG laser timely. We got EUV emission with pulse to pulse stability of 3.4% (1σ) from this droplet region without being destroyed due to hot laser plasma formation from the previous droplet.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jing Quan Lin, Hidehiko Yashiro, Tatsuya Aota, and Toshihisa Tomie "EUV generation using water droplet target", Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); doi: 10.1117/12.534708;


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