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20 May 2004 High-power short-pulse laser modules for laser-produced-plasma EUV source
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Abstract
We have recently made significant advances in the performance of our laser driver module employed in our laser produced plasma (LPP) EUV source. We increased the average power output from the laser whilst minimising the overall Cost of Ownership (CoO) and footprint of the system. In addition to minimising the CoO of the laser solution, it is necessary to choose an appropriate target that can attain the overall requirements of EUVL. We are currently investigating xenon in its various phases, as well as other target materials, in order to increase the conversion efficiency of the source and therefore further drive down its CoO. We have prepared a source roadmap in response to industry demands, and it shows that the combination of our demonstrated laser technology with available targets will meet the objectives for a production level source.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Samir Ellwi, Andrew Comley, N. Hay, and Michael Brownell "High-power short-pulse laser modules for laser-produced-plasma EUV source", Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); https://doi.org/10.1117/12.534015
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