20 May 2004 High-resolution EUV microstepper tool for resist testing and technology evaluation
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Abstract
Key features are presented of the Exitech MS-13 EUV Microstepper tool developed for EUV resist testing & technology evaluation at the 32nm node and beyond. Details of the tool design architecture, module layout, vacuum chamber, major subsystems including source, optics and performance specifications are given.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Adam Brunton, Julian Cashmore, Peter Elbourn, Graeme Elliner, Malcolm C. Gower, Philipp Grunewald, M. Harman, S. Hough, N. McEntee, S. Mundair, D. Rees, P. Richards, V. Truffert, Ian Wallhead, Mike Whitfield, "High-resolution EUV microstepper tool for resist testing and technology evaluation", Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); doi: 10.1117/12.548343; https://doi.org/10.1117/12.548343
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