20 May 2004 Nanostructuring of polymers by hot embossing lithography
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Abstract
While researchers of ever more advanced NGL systems are still struggling to demonstrate the feasibility to manufacture features well below 100 nm at an affordable cost and a reasonable throughput, nanoimprint technologies are emerging as a possible answer to these challenges. 100 nm patterns are imprinted with a fully patterned 4 inch diameter stamp in a low-temperature embossing process. In low temperature imprinting processes with polymers having very low glass transition temperatures heating and cooling cycles are minimized. This enables to increase the throughput of a hot embossing process, which is important for potential industrial applications.
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Hella-Christin Scheer, Hella-Christin Scheer, Thomas Glinsner, Thomas Glinsner, Matthias Wissen, Matthias Wissen, Rainer Pelzer, Rainer Pelzer, } "Nanostructuring of polymers by hot embossing lithography", Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); doi: 10.1117/12.535741; https://doi.org/10.1117/12.535741
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