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20 May 2004 Particle-cluster tin target for a high conversion efficiency LPP source for EUVL
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Particle-cluster tin target is presented as the solution of a 100W EUV source for EUVL. Theory for maximizing conversion efficiency of a laser-produced plasma is derived and the theory is experimentally confirmed by using a dispersed SnO2 particles. The EUV intensity 4 times higher than that from a plasma on a solid Sn plate target is observed at the optimized density. The achieved conversion efficiency for dispersed particles is estimated to be as high as 3%/(2π str 2%BW) or higher from the value for a Sn plate of 0.8% measured by using two multilayer mirrors and a calibrated photodiode. Theoretical consideration reveals that larger diameter plasma enables higher EUV power. The particle-cluster can be delivered at multi kHz rep-rate by using water droplet. Experimental confirmation of delivering particles by droplets is also reported.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Toshihisa Tomie, Tatsuya Aota, Jing Quan Lin, Yoshifumi Ueno, Hidehiko Yashiro, Noriaki Kandaka, Hiroki Moriwaki, Gohta Niimi, Isao Matsushima, and Kentaro Nishigori "Particle-cluster tin target for a high conversion efficiency LPP source for EUVL", Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004);

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