20 May 2004 Properties of EUV emissions from laser-produced tin plasmas
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Extreme ultraviolet (EUV) emission from laser produced plasma attracts much attention as a next generation lithography source. The characterization of EUV emission has been carried out using GEKKO XII laser system. The twelve beams irradiated tin or tin-oxide coated spherical targets uniformly and dependence of EUV spectra on laser intensity were obtained with a transmission grating spectrometer and two grazing incidence spectrometers. The EUV Conversion Efficiency (CE, the ratio of EUV energy at the wavelength of 13.5 nm with 2 % bandwidth to incident laser energy) was measured using an absolutely calibrated EUV calorimeter. Optimum laser intensities for the highest conversion were found to be 0.5- 1x1011 W/cm2 with CE of 3 %. The spectroscopic data indicate that shorter wavelength emission increases at higher laser intensities due to excessive heating beyond optimum temperatures (20- 40 eV). The CE was almost independent on the initial coating thickness down to 25 nm.
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Yoshinori Shimada, Yoshinori Shimada, Hiroaki Nishimura, Hiroaki Nishimura, Kazuhisa Hashimoto, Kazuhisa Hashimoto, Michiteru Yamaura, Michiteru Yamaura, Keisuke Shigemori, Keisuke Shigemori, Mitsuo Nakai, Mitsuo Nakai, Shinsuke Fujioka, Shinsuke Fujioka, Shigeaki Uchida, Shigeaki Uchida, Tomoharu Okuno, Tomoharu Okuno, Takahiro Hibino, Takahiro Hibino, Nobuyoshi Ueda, Nobuyoshi Ueda, Ryoji Matsui, Ryoji Matsui, Yezheng Tao, Yezheng Tao, Keiji Nagai, Keiji Nagai, Takayoshi Norimatsu, Takayoshi Norimatsu, Toru Kawamura, Toru Kawamura, Atsushi Sunahara, Atsushi Sunahara, Katsunobu Nishihara, Katsunobu Nishihara, Noriaki Miyanaga, Noriaki Miyanaga, Masahiro Nakatsuka, Masahiro Nakatsuka, Yasukazu Izawa, Yasukazu Izawa, Chihiro Yamanaka, Chihiro Yamanaka, } "Properties of EUV emissions from laser-produced tin plasmas", Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); doi: 10.1117/12.534959; https://doi.org/10.1117/12.534959

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