In extreme ultraviolet lithography (EUVL) environments transient plasma dynamics dictate conditions for particle/surface interactions. A critical challenge facing EUVL development is optic component lifetime both in gas-discharge produced plasmas (GDPP) and laser-produced plasmas (LPP) devices. Optic components are exposed to impingent species, impurities (H,C,O,N) and debris leading to their degradation and consequently limiting 13.5 nm light reflection intensity. Experiments in the PRIME (Particles and Radiation Interaction with Matter Experiments) facility at the Argonne National Laboratory study the synergy between radiation-induced athermal and thermal mechanisms that influence the behavior of EUVL materials (electrodes and condenser optics) under irradiation conditions including: incident particle energy (50 eV - 5 keV), angle-of-incidence (near-normal to oblique), incident flux (1011-1017 ions/cm2/s), surface coatings (impurity: C,O or capping layers: Ru, W), and surface temperature (100 - 1000 C). Results of electrode and optical component interaction with singly-charged inert gases (Xe) are presented. Critical issues under study include: radiation enhanced diffusion, radiation induced segregation, preferential sputtering, collisional mixing, surface segregation, surface amorphization, thermal diffusion and thermal spike evolution. Experiments in PRIME will be complemented with atomistic modeling to study how these mechanisms modify surfaces and how these mechanisms can work synergistically to introduce solutions to enhance component lifetime of electrode and condenser optic materials.