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20 May 2004 Silanized polymeric working stamps for hot embossing lithography
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Pattern replication into curable imprint resists by hot embossing offers the opportunity to use the replication after crosslinking as a working-stamp. The replications of a 4” Si stamp into the thermoset imprint polymer mr-I 9000R-XP with a commercial hot embossing system (EVGroup) have been coated with an anti-adhesive layer (trichlorosilane) from the gas-phase at ambient pressure. The investigation of the quality and durability of these anti-adhesive coatings reveals that the contact angles and the replication performance of the working-stamps were independent from the fact whether the polymer was already cured or still thermoplastic during the anti-adhesive coating. The prepared 4” working-stamps themselves have been successfully replicated into a low glass transition temperature resist (mr-L 6000.5 XP) and into PMMA.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Matthias Wissen, N. Bogdanski, R. Jerzy, Z. E. Berrada, Marion Fink, Freimut Reuther, Thomas Glinsner, and Hella-Christin Scheer "Silanized polymeric working stamps for hot embossing lithography", Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004);

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