20 May 2004 Step and Repeat UV nanoimprint lithography tools and processes
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Proceedings Volume 5374, Emerging Lithographic Technologies VIII; (2004); doi: 10.1117/12.538733
Event: Microlithography 2004, 2004, Santa Clara, California, United States
Abstract
Step and FlashTM Imprint Lithography (S-FILTM) process is a step and repeat nano-replication technique based on UV curable low viscosity liquids. Molecular Imprints, Inc. (MII) develops commercial tools that practice the S-FIL process. The current status of the S-FIL tool and process technology is presented in this paper. The specific topics that are covered include: • Residual layer control • Etch process development • Patterning of lines, contacts and posts • CD control • Defect and process life • Alignment and magnification control
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ian McMackin, Jin Choi, Philip Schumaker, Van Nguyen, Frank Xu, Ecron Thompson, Daniel Babbs, S. V. Sreenivasan, Mike Watts, Norman Schumaker, "Step and Repeat UV nanoimprint lithography tools and processes", Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); doi: 10.1117/12.538733; https://doi.org/10.1117/12.538733
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KEYWORDS
Ultraviolet radiation

Lithography

Semiconducting wafers

Liquids

Process control

Optical alignment

Optical lithography

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