20 May 2004 Subatomic accuracy in EUVL multilayer coatings
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Abstract
Reported is the production of multilayer EUV coatings on 25000 mm2 large mirror substrates using e-beam based deposition. The accuracy achieved over the full area and the full multilayer stack amounts to an added figure error of 0.02 nm, i.e. in the sub-atomic distance range, thus meeting the future requirements on EUV coating technology.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Erwin Zoethout, Erwin Zoethout, P. Suter, P. Suter, R. W.E. van de Kruijs, R. W.E. van de Kruijs, Andrey E. Yakshin, Andrey E. Yakshin, Eric Louis, Eric Louis, Fred Bijkerk, Fred Bijkerk, H. Enkisch, H. Enkisch, Stefan Muellender, Stefan Muellender, } "Subatomic accuracy in EUVL multilayer coatings", Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); doi: 10.1117/12.561319; https://doi.org/10.1117/12.561319
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