20 May 2004 Subatomic accuracy in EUVL multilayer coatings
Author Affiliations +
Reported is the production of multilayer EUV coatings on 25000 mm2 large mirror substrates using e-beam based deposition. The accuracy achieved over the full area and the full multilayer stack amounts to an added figure error of 0.02 nm, i.e. in the sub-atomic distance range, thus meeting the future requirements on EUV coating technology.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Erwin Zoethout, Erwin Zoethout, P. Suter, P. Suter, R. W.E. van de Kruijs, R. W.E. van de Kruijs, Andrey E. Yakshin, Andrey E. Yakshin, Eric Louis, Eric Louis, Fred Bijkerk, Fred Bijkerk, H. Enkisch, H. Enkisch, Stefan Muellender, Stefan Muellender, "Subatomic accuracy in EUVL multilayer coatings", Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); doi: 10.1117/12.561319; https://doi.org/10.1117/12.561319


EUV/soft x-ray multilayer optics
Proceedings of SPIE (January 26 2005)
Optical Properties Of Sputtered Si: H
Proceedings of SPIE (April 11 1982)
High-performance multilayer coatings for EUV lithography
Proceedings of SPIE (January 12 2004)
Design and fabrication of large-scale RB-SiC mirror
Proceedings of SPIE (November 20 2007)

Back to Top