Development of high-repetition-rate molecular fluorine lasers for metrology and inspection

Heinz P. Huber; Michael Bauer; Andreas J. Goertler; Claus F. Strowitzki; Alexander Hohla

doi:10.1117/12.534062

24 May 2004 Development of high-repetition-rate molecular fluorine lasers for metrology and inspection

Heinz P. Huber, Michael Bauer, Andreas J. Goertler, Claus F. Strowitzki, Alexander Hohla

Proceedings Volume 5375, Metrology, Inspection, and Process Control for Microlithography XVIII; (2004) https://doi.org/10.1117/12.534062
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

A new generation of compact Fluorine lasers has been developed for repetition rates up to 2 kHz. The output powers are in the range of 3 W at 157 nm. Due to the introduction of new concepts for the laser tube and the pulsed power module it was possible to increase the maximum repetition rate from 1 kHz to 2 kHz without any loss in the performance of the laser output parameters. The pulse-to-pulse stability of the laser energy is improved in comparison to previous laser generations. The results of long term tests and measurements of the laser output characteristic will be reported in detail. The state-of-the-art of compact excimer lasers will be presented and an outlook for future trends will be given.

Citation Download Citation

Heinz P. Huber, Michael Bauer, Andreas J. Goertler, Claus F. Strowitzki, and Alexander Hohla "Development of high-repetition-rate molecular fluorine lasers for metrology and inspection", Proc. SPIE 5375, Metrology, Inspection, and Process Control for Microlithography XVIII, (24 May 2004); https://doi.org/10.1117/12.534062

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