24 May 2004 Target noise in overlay metrology
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Abstract
We have developed a method for calculating the statistical effects of spatial noise on the overlay measurement extracted from a given overlay target. The method has been applied to two kinds of overlay targets on three process layers, and the new metric, Target Noise, has been shown to correlate well to the random component of Overlay Mark Fidelity. A significant difference in terms of robustness has been observed between AIM targets and conventional Frame-in-Frame targets. The results fit well into the spatial noise hierarchy presented in this paper.
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Joel L. Seligson, Joel L. Seligson, Mike E. Adel, Mike E. Adel, Pavel Izikson, Pavel Izikson, Vladimir Levinski, Vladimir Levinski, Dan Yaffe, Dan Yaffe, } "Target noise in overlay metrology", Proc. SPIE 5375, Metrology, Inspection, and Process Control for Microlithography XVIII, (24 May 2004); doi: 10.1117/12.534515; https://doi.org/10.1117/12.534515
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