Three-dimensional measurement by tilting and moving the objective lens in CD-SEM (II)

Kazuo Abe; Kouji Kimura; Yasuko Tsuruga; Shin-ichi Okada; Hitoshi Suzuki; Nobuo Kochi; Hirotami Koike; Akira Hamaguchi; Yuichiro Yamazaki

doi:10.1117/12.536134

24 May 2004 Three-dimensional measurement by tilting and moving objective lens in CD-SEM (II)

Kazuo Abe, Kouji Kimura, Yasuko Tsuruga, Shin-ichi Okada, Hitoshi Suzuki, Nobuo Kochi, Hirotami Koike, Akira Hamaguchi, Yuichiro Yamazaki

Author Affiliations +

Proceedings Volume 5375, Metrology, Inspection, and Process Control for Microlithography XVIII; (2004) https://doi.org/10.1117/12.536134
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

We report about three-dimensional measurement by CD-SEM. Last year, we reported that the new T-MOL (Tilting and Moving Objective Lens) electron optical system enabled the capture of tilt images without deterioration of the resolution and confirmed that the T-MOL system provides 4 nm resolution at tilting angle 5 degrees. In this year we developed and evaluated the new objective lens and the new octapole deflector for increase of tilting angle and improvement in resolution, and we confirmed that the new electron optical system provides 3.6 nm resolution at tilting angle 8 degrees. Moreover, we report the optimization of the stereo matching technique based on the tilting picture using the actual semiconductor device for measurement 3D analysis.

Citation Download Citation

Kazuo Abe, Kouji Kimura, Yasuko Tsuruga, Shin-ichi Okada, Hitoshi Suzuki, Nobuo Kochi, Hirotami Koike, Akira Hamaguchi, and Yuichiro Yamazaki "Three-dimensional measurement by tilting and moving objective lens in CD-SEM (II)", Proc. SPIE 5375, Metrology, Inspection, and Process Control for Microlithography XVIII, (24 May 2004); https://doi.org/10.1117/12.536134

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