PROCEEDINGS VOLUME 5376
MICROLITHOGRAPHY 2004 | 22-27 FEBRUARY 2004
Advances in Resist Technology and Processing XXI
Editor Affiliations +
MICROLITHOGRAPHY 2004
22-27 February 2004
Santa Clara, California, United States
Fundamental Resist Issues (Invited Papers)
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.533535
Willard E. Conley, Joseph J. Bendik
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.537609
Resist Material Issues in Immersion Lithography
William Hinsberg, Gregory M. Wallraff, Carl E. Larson, Blake W. Davis, Vaughn Deline, Simone Raoux, Dolores Miller, Frances A. Houle, John Hoffnagle, et al.
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.536576
Shinji Kishimura, Masayuki Endo, Masaru Sasago
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.534759
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.535881
Jae Chang Jung, Sung Koo Lee, Won Wook Lee, Cheol Kyu Bok, Seung Chan Moon, Ki Soo Shin
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.534786
193-nm Materials
Ratnam Sooriyakumaran, Blake W. Davis, Carl E. Larson, Phillip J. Brock, Richard A. DiPietro, Thomas I. Wallow, Eric F. Connor, Linda K. Sundberg, Gregory Breyta, et al.
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.536432
Gerd Pohlers, George G. Barclay, Azher Razvi, Carolyne Stafford, Anthony Barbieri, James F. Cameron
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.537186
Kaushal S. Patel, Margaret C. Lawson, Pushkara Rao Varanasi, David R. Medeiros, Gregory M. Wallraff, Phillip J. Brock, Richard A. DiPietro, Yukio Nishimura, Takashi Chiba, et al.
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.536874
Hitoshi Yamato, Toshikage Asakura, Tobias Hintermann, Masaki Ohwa
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.531803
Hyun Sang Joo, Dong Chul Seo, Chang Min Kim, Young Taek Lim, Seong Duk Cho, Jong Bum Lee, Ji Young Song, Kyoung Mun Kim, Joo Hyeon Park, et al.
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.535117
157-nm Materials
Francis M. Houlihan, Raj Sakamuri, Andrew Romano, David Rentkiewicz, Ralph R. Dammel, Willard E. Conley, Daniel A. Miller, Michael Sebald, Nickolay Stepanenko, et al.
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.537541
Yoko Takebe, Masataka Eda, Shinji Okada, Osamu Yokokoji, Shigeo Irie, Akihiko Otoguro, Kiyoshi Fujii, Toshiro Itani
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.533932
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.535098
Takuji Ishikawa, Tetsuhiro Kodani, Meiten Koh, Tsukasa Moriya, Takayuki Araki, Hirokazu Aoyama, Tsuneo Yamashita, Minoru Toriumi, Takuya Hagiwara, et al.
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.533901
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.534742
Akihiko Otoguro, Shigeo Irie, Toshiro Itani, Kiyoshi Fujii, Yoko Takebe, Yasuhide Kawaguchi, Osamu Yokokoji
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.535013
157-nm and 193-nm Processing I
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.534811
Eishi Shiobara, Kenji Chiba, Kei Hayasaki, Daisuke Kawamura
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.535142
David Van Steenwinckel, Hans Kwinten, Sabrina Locorotondo, Stephan Beckx
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.532695
Shigeo Irie, Kiyoshi Fujii, Yasuo Itakura, Youichi Kawasa , Keiji Egawa, Ikuo Uchino, Akira Sumitani, Toshiro Itani
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.535110
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.534610
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.535092
157-nm and 193-nm Processing II
Hyun-Woo Kim, Hyung-Rae Lee, Kyung-Mee Kim, Shi Yong Lee, Bong-Cheol Kim, Seok-Hwan Oh, Sang-Gyun Woo, Han-Ku Cho, Woo-Sung Han
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.534806
John A. Marsella, Atteye H. Abdourazak, Richard V. C. Carr, Thomas J. Markley, Eric A. Robertson III
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.535613
Jeff J. Meute, Georgia Rich, Karen Turnquest, Kim Dean, Shashikant Patel, Victoria L. Graffenberg, Michael P. Rodriguez
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.537652
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.533331
Resist Fundamentals I
Erin L. Jablonski, Vivek M. Prabhu, Sharadha Sambasivan, Daniel A Fischer, Eric K. Lin, Dario L. Goldfarb, Marie Angelopoulos, Hiroshi Ito
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.535703
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.535516
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.537581
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.536656
Poster Sessions
Won-Young Chung, Tai-Kyung Kim, Jin-Young Yoon, Hyun-Woo Kim, Young-Kwan Park, Jeong-Taek Kong
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.534809
Resist Fundamentals II
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.535599
Charles R. Chambers, Shiro Kusumoto, Brian P. Osborn, Alok Vasudev, Michitaka Ootani, Leonidas Walthal, Hale McMichael, Paul A. Zimmerman, Willard E. Conley, et al.
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.535941
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.535333
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.537701
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.537077
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.536218
LER
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.535623
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.537103
Ji-Young Lee, Jangho Shin, Hyun-Woo Kim, Sang-Gyun Woo, Han-Ku Cho, Woo-Sung Han, Joo-Tae Moon
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.534926
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.536021
Vivek M. Prabhu, Michael X. Wang, Erin L. Jablonski, Bryan D. Vogt, Eric K. Lin, Wen-Li Wu, Dario L. Goldfarb, Marie Angelopoulos, Hiroshi Ito
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.535862
ARC/Pattern Collapse/Defectivity
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.534735
Isabelle Danielle Guilmeau, Alice F. Guerrero, Vincent Blain, Stephanie Kremer, Vincent Vachellerie, Damien Lenoble, Patricia Nogueira, Sebastien Mougel, Jean-Damien Chapon
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.538061
Spyridon Skordas, Ryan L. Burns, Dario L. Goldfarb, Sean D. Burns, Marie Angelopoulos, Colin J. Brodsky, Margaret C. Lawson, Carole J. Pillette, Jeffrey J. Bright, et al.
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.537764
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.533981
Joint Session: Emerging/Advanced Processing and Novel Applications
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.536245
Wei He, Kenneth E. Gonsalves, Craig R. Halberstadt, Yusif Umar, Jae-Hak Choi
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.533367
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.534319
Brian R Harkness, Geoff B Gardner, James S Alger, Michelle R Cummings, Jennifer Princing, Yeong Lee, Herman Meynen, Mario Gonzales, Bart Vandevelde, et al.
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.533804
Poster Sessions
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.533907
Mitsuharu Yamana, Masumi Hirano, Seiji Nagahara, Makoto Tominaga
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.534596
Masamitsu Shirai, Toyofumi Shinozuka, Shinichi Takashiba, Yusuke Horiguchi, Shigeo Irie, Toshiro Itani
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.533649
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.535165
Vladimir Jakubek, Eric A. Robertson III, Atteye H. Abdourazak, Thomas J. Markley, John A. Marsella, Christopher K. Ober
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.536586
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.534999
Shi Yong Lee, Myungsun Kim, Sangwoong Yoon, Kyung-Mee Kim, Jae Hyun Kim, Hyun-Woo Kim, Sang-Gyun Woo, Young Ho Kim, Sang-Mun Chon, et al.
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.533884
Sangwoong Yoon, Myungsun Kim, Hong Lee, Do Young Kim, Young Hoon Kim, Boo Deuk Kim, Jae Hyun Kim, Kyung-Mee Kim, Shi Yong Lee, et al.
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.533950
Atsushi Otake, Emi Araya, Hikaru Momose, Ryuichi Ansai, Masayuki Tooyama, Tadayuki Fujiwara
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.534628
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.534675
Liyuan Wang, Wenjun Wang, Xin Guo
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.534513
Jin-Baek Kim, Ji-Hyun Jang, Jae-Hak Choi, Kwan-Ku Lee, Jong-Sung Ko
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.534533
Seung Keun Oh, Jong Yong Kim, Jae Woo Lee, Deogbae Kim, Jaehyun Kim, Geunsu Lee, Jae Chang Jung, Cheol Kyu Bok, Ki Soo Shin
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.534665
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.533817
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.534338
Liu He, Rama Puligadda, Joyce Lowes, Michael D. Rich
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.535245
Tadashi Hatanaka, Shigeo Kimura, Tomoyuki Enomoto, Yasuyuki Nakajima
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.534654
Wu-Sheng Shih, Charles J. Neef, Mark G. Daffron
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.535303
Jun Kyu Ahn, Seon Ho Choi, Young Keun Kim, Ki Yeop Park, Jae Sung Choi, Eun Suk Hong, Kang Sup Shin, Si Bum Kim, Kyeong Keun Choi, et al.
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.536282
Charles J. Neef, Vandana Krishnamurthy, Mariya I. Nagatkina, Evan Bryant, Michelle Windsor, Cheryl Nesbit
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.535423
Tomoyuki Enomoto, Satoshi Takei, Takahiro Kishioka, Tadashi Hatanaka, Rikimaru Sakamoto, Yasuyuki Nakajima
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.534653
Hengpeng Wu, Zhong Xiang, Aritaka Hishida, David Abdallah, Jianhui Shan, Eleazar Gonzalez, Shuji S. Ding, Mark Neisser
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.537883
Min-Ho Jung, Sangwoong Yoon, Eun-Soon Chung, Beom-Sang Yoo, Jeong Yun Ya, Don Winning, Boo Deuk Kim, Hong Lee, Do Young Kim, et al.
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.533924
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.535453
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.534763
Myoung-Soo Kim, Kew-Chan Shim, Hak-Joon Kim, Ki-Sung Kwon, Hong-Goo Lee, Chul-Seung Lee, Myung-Goon Gil, Yong-Wook Song
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.536159
Xiao Li, Warren Greene, Chris Bowker
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.534150
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.534332
Resist Fundamentals I
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.537723
Poster Sessions
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.536438
Richard D. Peters, Colita Parker, Jonathan Cobb, Eric Luckowski, Eric Weisbrod, Bill Dauksher
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.535643
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.536041
Vani Thirumala, Heidi B. Cao, Wang Yueh, Hokkin Choi, Victoria Golovkina, John Wallace, Paul F. Nealey, Don Thielman, Franco Cerrina
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.536052
William J. Mahoney III, Paul Roman, Paul Mumbauer, Jerzy Ruzyllo
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.534149
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.535202
Joon Yeon Cho, Se Jin Choi, Yong Jun Choi, Hong Lae Kim, Kee Ho Kim
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.535406
Jae Hyun Kim, Chang Ho Lee, Seok Bong Park, Won Mi Kim, Sang Sik Moon, Kyung-Mee Kim, Shi Yong Lee, Sangwoong Yoon, Young Ho Kim, et al.
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.533880
Peng Zhang, Manuel Jaramillo Jr., Madhukar B. Rao, Colin Yates, Danielle M. King, Brenda F. Ross, Bridget L. O'Brien
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.535819
Yuqiang Tu, Glenn H. Chapman, Jun Peng
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.536193
Peng Zhang, Manuel Jaramillo Jr., Danielle M. King, Madhukar B. Rao, Bridget L. O'Brien, Brenda F. Ross
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.535283
Geunsu Lee, Young Sun Hwang, Keun Do Ban, Cheol Kyu Bok, Seung Chan Moon, Ki Soo Shin
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.537193
Seiya Masuda, Masakazu Kobayashi, Woo-Kyu Kim, Clement Anyadiegwu, Munirathna Padmanaban, Ralph R. Dammel, Keiichi Tanaka, Yoshiaki Yamada
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.537409
Osamu Miyahara, Keiichi Tanaka, Shinya Wakamizu, Junichi Kitano, Yoshiaki Yamada
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.534983
Ivan Junarsa, Mark P. Stoykovich, Kenji Yoshimoto, Paul F. Nealey
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.533776
Hans Fosshaug, Per Askebjer, Johan Karlsson, Adisa Bajramovic, Kezhao Xing, Robert Eklund, Jonathan Walford, Mats Ekberg, Peter Hogfeldt, et al.
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.535821
Yousong Tao, Yulin Zhang, Dayao Li
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.527506
Ron R. Legario, Prasad S. Kelkar, Jacques Beauvais, Eric Lavallee, Dominique Drouin, Melanie Cloutier, David Turcotte, Pan Yang, Lau Kien Mun, et al.
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.535775
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.534045
Anja Voigt, Marina Heinrich, Gabi Gruetzner
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.535205
Medhat A. Toukhy, PingHung Lu, Kate Kao, Robert Plass, Ching-Hui Chen, Gerald L. Faerber
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.537561
Brad K. Avrit, Edward W. Maxwell, Lisa M. Huynh, Elliott S. Capsuto
Proceedings Volume Advances in Resist Technology and Processing XXI, (2004) https://doi.org/10.1117/12.537120