14 May 2004 Effect of background exposure dose upon line-edge roughness (LER)
Author Affiliations +
LER is found to correlate strongest with the background, or flare, portion of the lithographic aerial image contrast, when compared with the image slope and “standard” (max - min)/(max + min) contrast. A large pool of collected data and rigorous statistical analysis of variance conclude with far greater than 99% confidence that as any of these measures of aerial image profile degrade, LER increases. However, the relation between background exposure and LER is by far the most significant.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Mike V. Williamson, Mike V. Williamson, Andrew R. Neureuther, Andrew R. Neureuther, } "Effect of background exposure dose upon line-edge roughness (LER)", Proc. SPIE 5376, Advances in Resist Technology and Processing XXI, (14 May 2004); doi: 10.1117/12.535623; https://doi.org/10.1117/12.535623

Back to Top