Reactive dissolution kinetics of lithographic copolymers

William Hinsberg; Frances A. Houle; Hiroshi Ito

doi:10.1117/12.535599

14 May 2004 Reactive dissolution kinetics of lithographic copolymers

William Hinsberg, Frances A. Houle, Hiroshi Ito

Proceedings Volume 5376, Advances in Resist Technology and Processing XXI; (2004) https://doi.org/10.1117/12.535599
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

A wide range of phenomenological nonlinear dissolution behaviors has often been noted for real resist systems but no comprehensive framework has yet been proposed that explains the underlying physical phenomena and connects them to resist composition. We present a taxonomy of dissolution processes in representative resist copolymers measured using quartz crystal microbalance frequency-resistance analysis and optical reflectance measurements. The underlying physical and chemical processes leading to the observed behaviors are identified using a detailed chemical kinetics implementation of the critical ionization model for resist polymer dissolution.

Citation Download Citation

William Hinsberg, Frances A. Houle, and Hiroshi Ito "Reactive dissolution kinetics of lithographic copolymers", Proc. SPIE 5376, Advances in Resist Technology and Processing XXI, (14 May 2004); https://doi.org/10.1117/12.535599

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