Approximation of in-resist image by aerial image with 1/n-times shorter wavelength

Shuji Nakao; Jun Abe; Takashi Okagawa; Akira Imai; Hidehiko Kozawa; Akira Tokui; Kouichirou Tsujita

doi:10.1117/12.533368

28 May 2004 Approximation of in-resist image by aerial image with 1/n-times shorter wavelength

Shuji Nakao, Jun Abe, Takashi Okagawa, Akira Imai, Hidehiko Kozawa, Akira Tokui, Kouichirou Tsujita

Author Affiliations +

Proceedings Volume 5377, Optical Microlithography XVII; (2004) https://doi.org/10.1117/12.533368
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

An approximate in-resist image calculation method is proposed. From the configuration of light wave propagation in resist, sine of incident angle becomes 1/n times smaller than that in the air. Wavelength in resist is 1/n times shorter than that in the air; where n is refractive index of a resist. If wavelength in the air is 1/n times shorter at mask, sine of diffraction angle becomes 1/n times smaller, which is the same as the propagation angle of the diffracted light in resist for actual wavelength. Therefore, aerial image with 1/n times shorter wavelength under 1/n times smaller NA optics may become a good approximation of in-resist image for original wavelength, while attention should be required to image variation accompanied with z-shift of not observation point but z-shift of working wafer by which DOF is defined. We find that z-scale should be shrunk to obtain approximate DOF by a usual scaling law that is derived from phase relation of 3 beam interference with the largest interference at the optics. As an application of this calculation method, high NA ArF imaging, which will be realized by immersion optics, is investigated. Some interesting results, which may affect development strategy of ArF immersion lithography, are obtained in imaging characteristics. For example, resist blur in ArF resist, which seems to be much larger than that in KrF resist, may become the most serious problem to resolve a fine pattern with an extreme high NA ArF optics.

Citation Download Citation

Shuji Nakao, Jun Abe, Takashi Okagawa, Akira Imai, Hidehiko Kozawa, Akira Tokui, and Kouichirou Tsujita "Approximation of in-resist image by aerial image with 1/n-times shorter wavelength", Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); https://doi.org/10.1117/12.533368

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

;

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE