28 May 2004 Assessing the impact of intrinsic birefringence on 157-nm lithography
Author Affiliations +
Abstract
Birefringence can be represented using the matrix generated by multiplying together Jones matrices for the separate lens elements. Conventional vector imaging methods, which use orthogonal electric field components in resist combined to yield the intensity, can be extended to handle this matrix representation of the optical pupil. The mean amplitude ratio of the off-diagonal elements in the matrix pupil is shown to correspond quite well to the birefringence-induced CD error.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Nakgeuon Seong, Nakgeuon Seong, Kafai Lai, Kafai Lai, Alan E. Rosenbluth, Alan E. Rosenbluth, Gregg M. Gallatin, Gregg M. Gallatin, } "Assessing the impact of intrinsic birefringence on 157-nm lithography", Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); doi: 10.1117/12.544242; https://doi.org/10.1117/12.544242
PROCEEDINGS
5 PAGES


SHARE
Back to Top