DUV laser lithography for photomask fabrication

Curt A. Jackson; Peter Buck; Sarah Cohen; Vishal Garg; Charles Howard; Robert M. Kiefer; John Manfredo; James Tsou

doi:10.1117/12.534575

28 May 2004 DUV laser lithography for photomask fabrication

Curt A. Jackson, Peter Buck, Sarah Cohen, Vishal Garg, Charles Howard, Robert M. Kiefer, John Manfredo, James Tsou

Proceedings Volume 5377, Optical Microlithography XVII; (2004) https://doi.org/10.1117/12.534575
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

In the recent past significant work has been done to isolate and characterize suitable single layer Chemically Amplified Resist (CAR) systems for DUV printing applicable to photomask fabrication. This work is complicated by the inherent instability of most DUV CAR systems, particularly in air, showing unacceptable CD degradation over the normal photomask write time in today’s DUV mask pattern generators. The high reflectivity of most photomask substrates at DUV wavelengths, creating unacceptable standing waves in the photo resist profile, further compounds this problem. A single layer CAR system suitable for 90nm technology node mask fabrication with DUV printing has been characterized and optimized. Results of this optimization in terms of relevant mask making parameters will be detailed. Furthermore, comparison of the properties of this resist system to other commercially available systems, including FEP-171, will be shown. The pattern fidelity of DUV laser generated masks has been studied in considerable detail. A demonstration of the capabilities of the Etec Systems ALTA 4300 will be shown. The pattern fidelity achieved will be compared/contrasted to that achieved with today’s leading edge 50KeV vector scan e-beam systems. Advanced methods for modulating the DUV printed patterns’ fidelity will be detailed. Finally, the cost and cycle time implications of inserting the DUV laser pattern generator into the mask manufacturing flow will be discussed.

Citation Download Citation

Curt A. Jackson, Peter Buck, Sarah Cohen, Vishal Garg, Charles Howard, Robert M. Kiefer, John Manfredo, and James Tsou "DUV laser lithography for photomask fabrication", Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); https://doi.org/10.1117/12.534575

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available