Diffraction analysis of customized illumination technique

Chang-Moon Lim; Seo-Min Kim; Tae-Seung Eom; Seung Chan Moon; Ki Soo Shin

doi:10.1117/12.536357

28 May 2004 Diffraction analysis of customized illumination technique

Chang-Moon Lim, Seo-Min Kim, Tae-Seung Eom, Seung Chan Moon, Ki Soo Shin

Proceedings Volume 5377, Optical Microlithography XVII; (2004) https://doi.org/10.1117/12.536357
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

Various enhancement techniques such as alternating PSM, chrome-less phase lithography, double exposure, etc. have been considered as driving forces to lead the production k1 factor towards below 0.35. Among them, a layer specific optimization of illumination mode, so-called customized illumination technique receives deep attentions from lithographers recently. A new approach for illumination customization based on diffraction spectrum analysis is suggested in this paper. Illumination pupil is divided into various diffraction domains by comparing the similarity of the confined diffraction spectrum. Singular imaging property of individual diffraction domain makes it easier to build and understand the customized illumination shape. By comparing the goodness of image in each domain, it was possible to achieve the customized shape of illumination. With the help from this technique, it was found that the layout change would not gives the change in the shape of customized illumination mode.

Citation Download Citation

Chang-Moon Lim, Seo-Min Kim, Tae-Seung Eom, Seung Chan Moon, and Ki Soo Shin "Diffraction analysis of customized illumination technique", Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); https://doi.org/10.1117/12.536357

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