Illumination source mapping and optimization with resist based process metrics for low k1 imaging

Guohong Zhang; Steve Hansen

doi:10.1117/12.536006

28 May 2004 Illumination source mapping and optimization with resist-based process metrics for low-k₁ imaging

Guohong Zhang, Steve Hansen

Proceedings Volume 5377, Optical Microlithography XVII; (2004) https://doi.org/10.1117/12.536006
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

Pattern specific illuminator optimization is a key component in developing low k₁ lithography solutions that utilize off-axis illumination schemes. Aerial image metrics such as NILS (normalized image log slope) have been used in the past to select the optimal illuminator source shape that yields the largest process margin such as DOF. A more practical and process orientated approach is presented in this paper with resist also included in the optimization scheme. Here pupil fill calculation is based on the actual process metrics such as DOF at certain exposure latitude, mask error enhancement factor (MEEF), mask bias (OPC), and CD uniformity (ACLV). A comparison is made with the conventional aerial image based approach. Examples are given to illustrate the advantages of the resist simulation based optimization scheme and its potential application in global process optimization by using a common, universal set of process metrics. This makes it possible to search for the optimal scanner optics settings through simulation techniques over a parameter space with many degrees of freedom, which is difficult to explore simply with limited empirical data collection. As a result, resist based illumination source optimization dramatically reduces the process development cycle, particularly for low k₁ critical patterns.

Citation Download Citation

Guohong Zhang and Steve Hansen "Illumination source mapping and optimization with resist-based process metrics for low-k₁ imaging", Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); https://doi.org/10.1117/12.536006

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