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28 May 2004 Implementation of pattern-specific illumination pupil optimization on Step & Scan systems
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Abstract
Step&Scan systems are pushed towards low k1 applications. Contrast enhancement techniques are crucial for successful implementation of these applications in a production environment. A NA - sigma - illumination mode optimizer and a contrast-based optimization algorithm are implemented in LithoCruiser in order to optimize illumination setting and illumination pupil for a specific repetitive pattern. Calculated illumination pupils have been realized using Diffractive Optical Elements (DOE), which are supported by ASML's AERIAL II illuminator. The qualification of the illumination pupil is done using inline metrology on the ASML Step & Scan system. This paper describes the process of pattern specific illumination optimization for a given mask. Multiple examples will be used to demonstrate the advantage of using non-standard illumination pupils.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Andre Engelen, Robert John Socha, Eric Hendrickx, Wieger Scheepers, Frank Nowak, Marco Van Dam, Armin Liebchen, and Denis A.M. Faas "Implementation of pattern-specific illumination pupil optimization on Step & Scan systems", Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); https://doi.org/10.1117/12.544240
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