Layer-specific illumination for low k1 periodic and semiperiodic DRAM cell patterns: design procedure and application

Chan Hwang; Dong-Seok Nam; Jin-Hong Park; Sang-Gyun Woo; Han-Ku Cho; Woo-Sung Han

doi:10.1117/12.536362

28 May 2004 Layer-specific illumination for low-k₁ periodic and semiperiodic DRAM cell patterns: design procedure and application

Chan Hwang, Dong-Seok Nam, Jin-Hong Park, Sang-Gyun Woo, Han-Ku Cho, Woo-Sung Han

Author Affiliations +

Proceedings Volume 5377, Optical Microlithography XVII; (2004) https://doi.org/10.1117/12.536362
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

The optical resolution of photolithography is limited by the numerical aperture (NA) of lens, wavelength of light source, and k₁ factor. Nowadays, the low k1 process is necessary, since the tool development is delayed due to technology difficulties. In order to enhance the process latitude in the low k₁ region, special illumination design for specific patterns has been studied. Although illumination optimization is one of the promising solutions to develop the low k₁ process, specific design for each pattern has not been applied since the case-by-case illumination design is not easy. The specific layer oriented illumination design is generated using our in-house tool. A DRAM cell is composed of periodic or semi-periodic patterns, and the design of layer specific illumination is made for those patterns with the target of enlarged depth of focus (DOF). It is observed that the DOF and exposure latitude of a DRAM isolated pattern using the optimized illumination are increased in comparison with the conventional annular illumination. It is expected that the lifetime of low-grade exposure tools can be extended by this illumination optimization technique.

Citation Download Citation

Chan Hwang, Dong-Seok Nam, Jin-Hong Park, Sang-Gyun Woo, Han-Ku Cho, and Woo-Sung Han "Layer-specific illumination for low-k₁ periodic and semiperiodic DRAM cell patterns: design procedure and application", Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); https://doi.org/10.1117/12.536362

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