Mask induced polarization

Andrew Estroff; Yongfa Fan; Anatoly Bourov; Frank Charles Cropanese; Neal Vincent Lafferty; Lena V. Zavyalova; Bruce W. Smith

doi:10.1117/12.546423

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28 May 2004 Mask-induced polarization

Andrew Estroff, Yongfa Fan, Anatoly Bourov, Frank Charles Cropanese, Neal Vincent Lafferty, Lena V. Zavyalova, Bruce W. Smith

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Proceedings Volume 5377, Optical Microlithography XVII; (2004) https://doi.org/10.1117/12.546423
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

The objective of this paper is to study the polarization induced by mask structures. Rigorous coupled-wave analysis (RCWA) was used to study the interaction of electromagnetic waves with mask features. RCWA allows the dependence of polarization effects of various wavelengths of radiation on grating pitch, profile, material, and thickness to be studied. The results show that for the five different mask materials examined, the material properties, mask pitch, and illumination all have a large influence on how the photomask polarizes radiation.

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Andrew Estroff, Yongfa Fan, Anatoly Bourov, Frank Charles Cropanese, Neal Vincent Lafferty, Lena V. Zavyalova, and Bruce W. Smith "Mask-induced polarization", Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); https://doi.org/10.1117/12.546423

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