Nikon projection lens update

Tomoyuki Matsuyama; Toshiro Ishiyama; Yasuhiro Omura

doi:10.1117/12.537206

28 May 2004 Nikon projection lens update

Tomoyuki Matsuyama, Toshiro Ishiyama, Yasuhiro Omura

Proceedings Volume 5377, Optical Microlithography XVII; (2004) https://doi.org/10.1117/12.537206
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

This paper describes various kinds of technological improvements in ArF projection lenses for success in very low-k₁ and high NA lithography. This paper covers optical design, lens manufacturing, aberration characterization, aberration manipulation, flare control, and linear polarizing illumination. Actual lens performance of the Nikon NSR-S307E (0.85NA ArF Optics) is also reviewed.

Citation Download Citation

Tomoyuki Matsuyama, Toshiro Ishiyama, and Yasuhiro Omura "Nikon projection lens update", Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); https://doi.org/10.1117/12.537206

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