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28 May 2004 Novel methodology for photo condition optimization through simulation
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Abstract
In photo process development, simulation plays a very important role to optimize the photo condition prior to exposure wafers. In this report we would address a systematic methodology to accelerate the photo condition optimization through simulation with the aids of statistical methods. Moreover, this systematic methodology could also be used in any experiment design and emerges as a feasibility of automatic process optimization.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Irene Yi-Ju Su, Rachel Huang, Ta-Hung H. Yang, Kevin Tu, Smith Peng, and Chih-Yuan Lu "Novel methodology for photo condition optimization through simulation", Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); https://doi.org/10.1117/12.533422
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