28 May 2004 Process effects in flare measurement
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Abstract
Flare has become a significant problem for low K1 lithography. Several authors have reported measurement of flare in projection lenses. Most of the work is based on the Flagello-Kirk method using resist clearing dose. To measure the flare reliably and accurately using this method the contribution of the process needs to be understood. In this paper we present data looking at the influence of such effects on the measured flare.
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Pary Baluswamy, Pary Baluswamy, Linda Somerville, Linda Somerville, } "Process effects in flare measurement", Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); doi: 10.1117/12.535474; https://doi.org/10.1117/12.535474
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