28 May 2004 Understanding focus in projection lithography systems
Author Affiliations +
Characterizing best focus for lithographic patterns is a very common task. It has been observed that the estimated best focus changes considerably with substrate type and substrates change quite frequently in process development. Such effects are seen even when the resist thickness is not altered. In this paper we will present data to identify the cause of the change and throw some light on the interaction between substrate and scanner leveling system.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Pary Baluswamy, Pary Baluswamy, Hiroyuki Yamamoto, Hiroyuki Yamamoto, Zornitza Krasteva, Zornitza Krasteva, Linda Somerville, Linda Somerville, } "Understanding focus in projection lithography systems", Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); doi: 10.1117/12.536028; https://doi.org/10.1117/12.536028

Back to Top