Multivariable versus univariable APC

Kamyar Faron; Mark Freeland; Ole Krogh; Sukesh Patel; Gayathri Raghavendra

doi:10.1117/12.536472

29 April 2004 Multivariable versus univariable APC

Kamyar Faron, Mark Freeland, Ole Krogh, Sukesh Patel, Gayathri Raghavendra

Proceedings Volume 5378, Data Analysis and Modeling for Process Control; (2004) https://doi.org/10.1117/12.536472
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

The need for process control in the semiconductor industry has been established and the benefits have been demonstrated. In the past, process control applications in the semiconductor manufacturing have relied on univariable control schemes. In the case of poly gate etch control methods have manipulated trim time or O₂ flow to maintain a target poly gate FI CD target as the input DI CD varies. This study focuses on the impact of process control on secondary output goals and compares the effect of univariable control with that of multivariable control. There are two important conclusions for semiconductor manufacturers: (i) univariable control schemes sacrifice secondary control goals when trying to achieve the primary control goal and (ii) manufacturers must adopt multi-input multi-output control schemes to actively control both secondary process goals and primary control goals.

Citation Download Citation

Kamyar Faron, Mark Freeland, Ole Krogh, Sukesh Patel, and Gayathri Raghavendra "Multivariable versus univariable APC", Proc. SPIE 5378, Data Analysis and Modeling for Process Control, (29 April 2004); https://doi.org/10.1117/12.536472

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