29 April 2004 Use case approach to integrating and implementing lithography run-to-run control
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Abstract
The benefits of using a run-to-run control system for overlay and CD control have been well documented. However, before any these benefits can be achieved, one must first integrate the run-to-run control system into the existing automation and manufacturing execution system (MES) environment. Integration details that are overlooked during the planning stages often times create unnecessary challenges down the road that can delay reaching advantageous control results. INFICON has developed a novel methodology of documenting process and integration requirements. This method, termed Use Case Review, congregates the appropriate resources from the supplier and the customer to review and customize a predetermined set of documents that describe the run-to-run controller. Each use case contains a flow diagram and a detailed sequence of transactions documenting the actors (Automation PC, Process Equipment, MES, etc.) and variables (Lot ID, Process Level ID, Recipe ID, etc.) involved. The combined set of use cases covers all aspects of integrating a lithography run-to-run controller. During the implementation of NVS ARGUS, TOWER Semiconductor Ltd. benefited from use case review and customization.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Dorit Karlikar, Dorit Karlikar, Irit K. Abramovich, Irit K. Abramovich, Miri Kish, Miri Kish, David Crow, David Crow, Etienne Joubert, Etienne Joubert, Alan Carlson, Alan Carlson, "Use case approach to integrating and implementing lithography run-to-run control", Proc. SPIE 5378, Data Analysis and Modeling for Process Control, (29 April 2004); doi: 10.1117/12.535667; https://doi.org/10.1117/12.535667
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