3 May 2004 Layout modification for library cell Alt-PSM composability
Author Affiliations +
Proceedings Volume 5379, Design and Process Integration for Microelectronic Manufacturing II; (2004); doi: 10.1117/12.538900
Event: Microlithography 2004, 2004, Santa Clara, California, United States
In sub-wavelength lithography, light field Alt-PSM (Alternating Phase Shifting Mask) is an essential technology for poly layer printability. In a standard cell based design, the problem of obtaining Alt-PSM compliance for an individual cell layout has been solved well [3]. However, placing Alt-PSM compliant cells together can not guarantee Alt-PSM compliance of the entire chip/block layout due to phase interactions among adjacent cells. A simple solution to this Alt-PSM composability problem is to wrap blank area around each cell, which is very inefficient on chip area usage. In this paper, we formulate the composability problem as a graph model and propose a polynomial time optimal algorithm to achieve Alt-PSM composability with the least impact on cell layout.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ke Cao, Jiang Hu, Mosong Cheng, "Layout modification for library cell Alt-PSM composability", Proc. SPIE 5379, Design and Process Integration for Microelectronic Manufacturing II, (3 May 2004); doi: 10.1117/12.538900; https://doi.org/10.1117/12.538900

Computer aided design


Phase shifts

Phase shifting

Resolution enhancement technologies



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