Characterization Of Stepper - Lens Aberrations And Critical Dimension Control

Paul Chien; Ling Liauw; Mung Chen

doi:10.1117/12.947766

23 July 1985 Characterization Of Stepper - Lens Aberrations And Critical Dimension Control

Paul Chien, Ling Liauw, Mung Chen

Proceedings Volume 0538, Optical Microlithography IV; (1985) https://doi.org/10.1117/12.947766
Event: 1985 Microlithography Conferences, 1985, Santa Clara, United States

Abstract

Demands for higher resolution and larger field size are pushing the limits of optical design and manufacturing technology. A simple method of characterizing lens aberrations is proposed in this paper. The effects of astigmatism, field curvature and other aberrations are analyzed. A method of estimating the variation in focal depth for a given resist process and device technology is also proposed. The combined results can be used to determine the minimum feature size and maximum field size to be used with adequate linewidth control. In addition, the lens characterization method can be used for detecting problems with the lens quality and image orthogonality.

Citation Download Citation

Paul Chien, Ling Liauw, and Mung Chen "Characterization Of Stepper - Lens Aberrations And Critical Dimension Control", Proc. SPIE 0538, Optical Microlithography IV, (23 July 1985); https://doi.org/10.1117/12.947766

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