High Performance Retrofit Condenser For Perkin-Elmer Aligners

Ray Winn; Ron Hershel

doi:10.1117/12.947749

23 July 1985 High Performance Retrofit Condenser For Perkin-Elmer Aligners

Ray Winn, Ron Hershel

Proceedings Volume 0538, Optical Microlithography IV; (1985) https://doi.org/10.1117/12.947749
Event: 1985 Microlithography Conferences, 1985, Santa Clara, United States

Abstract

A retrofit illuminator for the High Performance Condenser for the 100, 200, and 300 series Perkin-Eimer Micralign projection aligners is discussed. Comparisons of the major performance features between the two systems is made shoeing dramatic improvements in wafer through-put, a reduction of nearly 2,000 watts of electrical power consumption, reduction of the arc slit width, and significantly reduced maintenance time. Some SEM's of typical lithography are also presented.

Citation Download Citation

Ray Winn and Ron Hershel "High Performance Retrofit Condenser For Perkin-Elmer Aligners", Proc. SPIE 0538, Optical Microlithography IV, (23 July 1985); https://doi.org/10.1117/12.947749

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