One Micron 1X Stepper Photolithography: An Introductory View

Mark S. Chang

doi:10.1117/12.947744

23 July 1985 One Micron 1X Stepper Photolithography: An Introductory View

Mark S. Chang

Proceedings Volume 0538, Optical Microlithography IV; (1985) https://doi.org/10.1117/12.947744
Event: 1985 Microlithography Conferences, 1985, Santa Clara, United States

Abstract

A feasibility study of 1X optical stepper for one micron lithography in a manufacturing environment is conducted. The present discussion concentrates on the availability and per-formance of production-worthy 1X optical stepper, and the manufacturability of one micron reticle including the 0.5μm defect inspection. The Ultratech Stepper Model 1000 with one micron lens and the KLA-208 automatic reticle inspection system are evaluated and their performances are discussed.

Citation Download Citation

Mark S. Chang "One Micron 1X Stepper Photolithography: An Introductory View", Proc. SPIE 0538, Optical Microlithography IV, (23 July 1985); https://doi.org/10.1117/12.947744

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