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9 September 2004 Fabrication of diffractive optical elements with grayscale photo-lithography
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Proceedings Volume 5380, Optical Data Storage 2004; (2004) https://doi.org/10.1117/12.556684
Event: Optical Data Storage Topical Meeting, 2004, Monterey, California, United States
Abstract
We have developed diffractive optical element (DOE) to compensate chromatic aberration happened in aspheric lens surfaces in micro optical system. The DOE was generated with grayscale lithography using high-energy-beam-sensitive (HEBS)-glass, and we finally obtained DOEs having 4levels and 8levels through this fabrication.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Wan-chin Kim, Myung-bok Lee, Jin-seung Sohn, Eun-hyung Cho, Chan-young Yoon, No-cheol Park, and Young-pil Park "Fabrication of diffractive optical elements with grayscale photo-lithography", Proc. SPIE 5380, Optical Data Storage 2004, (9 September 2004); https://doi.org/10.1117/12.556684
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