Paper
29 July 2004 High-aspect-ratio neural probes for monolithic integration with ultra-low-power CMOS operational amplifier circuit
Author Affiliations +
Abstract
A microprobe array for recording neural signals has been designed and fabricated for future monolithic integration with an ultra-low power CMOS operational amplifier circuit on a 2 mm × 2 mm chip. A LIGA-like process is employed utilizing UV lithography and electrodeposition techniques. Probes are fabricated on silicon substrate. The fabrication process is compatible with monolithic integration with CMOS signal processing circuitry. The probes are 210 um high and have an aspect ratio 3:1. Comments are made on processing issues related to chip-level monolithic integration.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Tinghui Xin, Pratul K. Ajmera, Chuang Zhang, and Ashok Srivastava "High-aspect-ratio neural probes for monolithic integration with ultra-low-power CMOS operational amplifier circuit", Proc. SPIE 5389, Smart Structures and Materials 2004: Smart Electronics, MEMS, BioMEMS, and Nanotechnology, (29 July 2004); https://doi.org/10.1117/12.539593
Lens.org Logo
CITATIONS
Cited by 3 scholarly publications.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Nickel

Silicon

Amplifiers

Electroplating

Signal processing

Semiconducting wafers

Copper

Back to Top