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18 April 1985 Two Anti-Reflective Coatings For Use Over Highly Reflective Topography
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Abstract
Two anti-reflective coatings have been developed which eliminate linewidth variation of HPR-204 and HX-256 over stepped highly reflective topography. These anti-reflective coatings are composed of non-photoactive modified polyimides and laser dyes. Thin coatings exhibit the following desirable properties; strong absorption of 436nm light, the ability to dry etch, resistance to flow at 200°C, and good planarization properties.
© (1985) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
A. T. Jeffries, M. Toukhy, and T. R. Sarubbi "Two Anti-Reflective Coatings For Use Over Highly Reflective Topography", Proc. SPIE 0539, Advances in Resist Technology and Processing II, (18 April 1985); https://doi.org/10.1117/12.947851
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