Visit My Account to manage your email alerts.
Extreme aberration properties of the combined immersion lenses and their prospects in ion nanolithography
Influence of cylindrical pole sizes to parameters of high-dispersion mass-analyzer with inhomogeneous magnetic field
Influence of parameters of the plasma electron sources on the characteristics of narrow electron beam
Electron beam with homogeneous solids interaction simulation using Monte-Carlo method in discrete looses approximation
Model of independent sources used for calculation of distribution of minority charge carriers generated in two-layer semiconductor by electron beam
Effect of plasma chemical etching on the properties of thin polyimide coatings differing by the chemical composition and molecular weight
Some possibilities of the use of confluence analysis for an interval parameter estimation of semiconductors in a cathodoluminescent microscopy