Paper
28 May 2004 An investigation into nano-dimensional fractal film structures
Igor N. Serov, Gennady N. Lukyanov, Vladimir I. Margolin, Nikita A. Potsar, Inga A. Soltovskaya, Valentin S. Fantikov
Author Affiliations +
Proceedings Volume 5401, Micro- and Nanoelectronics 2003; (2004) https://doi.org/10.1117/12.558315
Event: Micro- and Nanoelectronics 2003, 2003, Zvenigorod, Russian Federation
Abstract
This work is dedicated to experimental studies of the action of fraktal-matrix strukturizator “Aires” on the processes of increasing on the thin nano-dimensional films of copper, titanium and number of others. It is established that under the action of strukturizators it is possible to obtain films with the clearly expressed fraktal structure, moreover at different levels. Are given the results of a study with the aid of optics, SEM and AFM of the microscopy. As a result of a complex of the lead researches influence fractal-matrix strukturizators on the processes proceeding at condensation thin nano-dimensional films from vapor or the plasma environment with use of methods magnetron ionic - plasma spattering and thermal vacuum evaporation is revealed.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Igor N. Serov, Gennady N. Lukyanov, Vladimir I. Margolin, Nikita A. Potsar, Inga A. Soltovskaya, and Valentin S. Fantikov "An investigation into nano-dimensional fractal film structures", Proc. SPIE 5401, Micro- and Nanoelectronics 2003, (28 May 2004); https://doi.org/10.1117/12.558315
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KEYWORDS
Copper

Fractal analysis

Fermium

Frequency modulation

Scanning electron microscopy

Silicon

Silicon films

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