Paper
28 May 2004 Automatical optimization of pupil filters for high-resolution photolithography
M. Machin, M. Gitlin, Nikolay G. Savinskii
Author Affiliations +
Proceedings Volume 5401, Micro- and Nanoelectronics 2003; (2004) https://doi.org/10.1117/12.556989
Event: Micro- and Nanoelectronics 2003, 2003, Zvenigorod, Russian Federation
Abstract
A pupil filter optimization algorithm is presented. The algorithm was tested for low-aperture stepper. The experimental data for resolution and depth of focus enhancement are described.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
M. Machin, M. Gitlin, and Nikolay G. Savinskii "Automatical optimization of pupil filters for high-resolution photolithography", Proc. SPIE 5401, Micro- and Nanoelectronics 2003, (28 May 2004); https://doi.org/10.1117/12.556989
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KEYWORDS
Image filtering

Optimal filtering

Image quality

Optical lithography

Optimization (mathematics)

Photoresist materials

Diffraction

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