28 May 2004 EUV radiation from plasma of a pseudospark discharge in its different stages
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Proceedings Volume 5401, Micro- and Nanoelectronics 2003; (2004) https://doi.org/10.1117/12.556972
Event: Micro- and Nanoelectronics 2003, 2003, Zvenigorod, Russian Federation
Abstract
The paper describes the main features of the pulsed low-pressure gas discharge in oxygen and xenon, which burns in typical conditions of EUV source operation. It is shown that in a mode of the superdense glow discharge the electron temperature in the discharge plasma is high enough to provide for generation of EUV radiation without magnetic compression of the plasma column.
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Yuri D. Korolev, Yuri D. Korolev, O. B. Frants, O. B. Frants, V. G. Geyman, V. G. Geyman, R. V. Ivashov, R. V. Ivashov, N. V. Landl, N. V. Landl, I. A. Shemyakin, I. A. Shemyakin, } "EUV radiation from plasma of a pseudospark discharge in its different stages", Proc. SPIE 5401, Micro- and Nanoelectronics 2003, (28 May 2004); doi: 10.1117/12.556972; https://doi.org/10.1117/12.556972
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